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Comparison of MDA and EMC in Robustness against Over-fitting for Facial Expression Recognition
https://ipsj.ixsq.nii.ac.jp/records/51907
https://ipsj.ixsq.nii.ac.jp/records/51907421ee539-db2c-4352-8eef-a6a8f8c6dffa
名前 / ファイル | ライセンス | アクション |
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Copyright (c) 2008 by the Information Processing Society of Japan
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オープンアクセス |
Item type | SIG Technical Reports(1) | |||||||
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公開日 | 2008-03-11 | |||||||
タイトル | ||||||||
タイトル | Comparison of MDA and EMC in Robustness against Over-fitting for Facial Expression Recognition | |||||||
タイトル | ||||||||
言語 | en | |||||||
タイトル | Comparison of MDA and EMC in Robustness against Over-fitting for Facial Expression Recognition | |||||||
言語 | ||||||||
言語 | eng | |||||||
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資源タイプ識別子 | http://purl.org/coar/resource_type/c_18gh | |||||||
資源タイプ | technical report | |||||||
著者所属 | ||||||||
School of Information Science Japan Advanced Institute of Science and Technology | ||||||||
著者所属 | ||||||||
School of Information Science Japan Advanced Institute of Science and Technology | ||||||||
著者所属(英) | ||||||||
en | ||||||||
School of Information Science, Japan Advanced Institute of Science and Technology | ||||||||
著者所属(英) | ||||||||
en | ||||||||
School of Information Science, Japan Advanced Institute of Science and Technology | ||||||||
著者名 |
Fan, Chen
× Fan, Chen
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著者名(英) |
Fan, Chen
× Fan, Chen
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論文抄録 | ||||||||
内容記述タイプ | Other | |||||||
内容記述 | Eigen-space Mehod based on Class-features (EMC) a variant of Multiple Discriminant Analysis (MDA). has been proposed and applied for automatic facial expression recognition. Although EMC was reported to outperform MDA in Ref. [1] [2] no mathematical explanations for the difference of performance have been given. In the present paper we will first refomualte MDA and EMC based on a new model of Maximum Log Likelihood (MLL) estimation. By using this model we will explain from the perspective of statistical inference that the difference of the underlying mechanism locates in that EMC is a variant of MDA with lower degree of freedom by assuming the covariance to be sphered in all directions. A thorough comparison between EMC and MDA in robust recognition of facial expressions will also be made to verify our conclusion that EMC outperforms MDA because it is more robust against over-fitting due to its lower degree of freedom. | |||||||
論文抄録(英) | ||||||||
内容記述タイプ | Other | |||||||
内容記述 | Eigen-space Mehod based on Class-features (EMC), a variant of Multiple Discriminant Analysis (MDA). has been proposed and applied for automatic facial expression recognition. Although EMC was reported to outperform MDA in Ref. [1] [2], no mathematical explanations for the difference of performance have been given. In the present paper, we will first refomualte MDA and EMC based on a new model of Maximum Log Likelihood (MLL) estimation. By using this model, we will explain from the perspective of statistical inference that the difference of the underlying mechanism locates in that EMC is a variant of MDA with lower degree of freedom by assuming the covariance to be sphered in all directions. A thorough comparison between EMC and MDA in robust recognition of facial expressions will also be made to verify our conclusion that EMC outperforms MDA because it is more robust against over-fitting due to its lower degree of freedom. | |||||||
書誌レコードID | ||||||||
収録物識別子タイプ | NCID | |||||||
収録物識別子 | AA11131797 | |||||||
書誌情報 |
情報処理学会研究報告コンピュータビジョンとイメージメディア(CVIM) 巻 2008, 号 27(2008-CVIM-162), p. 483-488, 発行日 2008-03-11 |
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Notice | ||||||||
SIG Technical Reports are nonrefereed and hence may later appear in any journals, conferences, symposia, etc. | ||||||||
出版者 | ||||||||
言語 | ja | |||||||
出版者 | 情報処理学会 |