{"metadata":{"_oai":{"id":"oai:ipsj.ixsq.nii.ac.jp:00033063","sets":["1164:2735:2748:2749"]},"path":["2749"],"owner":"1","recid":"33063","title":["Influential領域を導入した適応型光近接効果補正技術の提案"],"pubdate":{"attribute_name":"公開日","attribute_value":"2006-12-21"},"_buckets":{"deposit":"5171a73c-f580-4559-bba2-9b4c823d3354"},"_deposit":{"id":"33063","pid":{"type":"depid","value":"33063","revision_id":0},"owners":[1],"status":"published","created_by":1},"item_title":"Influential領域を導入した適応型光近接効果補正技術の提案","author_link":["0","0"],"item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Influential領域を導入した適応型光近接効果補正技術の提案"},{"subitem_title":"Adaptive optical proximity correction utilizing influential area","subitem_title_language":"en"}]},"item_type_id":"4","publish_date":"2006-12-21","item_4_text_3":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_value":"筑波大学大学院システム情報工学研究科"},{"subitem_text_value":"半導体ＭＩＲＡＩプロジェクト産業技術総合研究所ＭＩＲＡＩ－ＡＳＲＯ，AISＴ"},{"subitem_text_value":"半導体ＭＩＲＡＩプロジェクト産業技術総合研究所ＭＩＲＡＩ－ＡＳＲＯ，AISＴ"},{"subitem_text_value":"半導体ＭＩＲＡＩプロジェクト産業技術総合研究所ＭＩＲＡＩ－ＡＳＲＯ，AISＴ"},{"subitem_text_value":"半導体ＭＩＲＡＩプロジェクト産業技術総合研究所ＭＩＲＡＩ－ＡＳＲＯ，AISＴ"},{"subitem_text_value":"（株)半導体先端テクノロジーズ"},{"subitem_text_value":"（株)半導体先端テクノロジーズ"},{"subitem_text_value":"（株)半導体先端テクノロジーズ"},{"subitem_text_value":"筑波大学大学院システム情報工学研究科／半導体ＭＩＲＡＩプロジェクト産業技術総合研究所ＭＩＲＡＩ－ＡＳＲＯ，AISＴ"}]},"item_4_text_4":{"attribute_name":"著者所属(英)","attribute_value_mlt":[{"subitem_text_value":"University of Tsukuba","subitem_text_language":"en"},{"subitem_text_value":"MIRAI-ASRC, AIST","subitem_text_language":"en"},{"subitem_text_value":"MIRAI-ASRC, AIST","subitem_text_language":"en"},{"subitem_text_value":"MIRAI-ASRC, AIST","subitem_text_language":"en"},{"subitem_text_value":"MIRAI-ASRC, AIST","subitem_text_language":"en"},{"subitem_text_value":"Semiconductor Leading Edge Technologies, Inc.","subitem_text_language":"en"},{"subitem_text_value":"Semiconductor Leading Edge Technologies, Inc.","subitem_text_language":"en"},{"subitem_text_value":"Semiconductor Leading Edge Technologies, Inc.","subitem_text_language":"en"},{"subitem_text_value":"University of Tsukuba/MIRAI-ASRC, AIST","subitem_text_language":"en"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_publisher":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"情報処理学会","subitem_publisher_language":"ja"}]},"publish_status":"0","weko_shared_id":-1,"item_file_price":{"attribute_name":"Billing file","attribute_type":"file","attribute_value_mlt":[{"url":{"url":"https://ipsj.ixsq.nii.ac.jp/record/33063/files/IPSJ-MPS06062002.pdf"},"date":[{"dateType":"Available","dateValue":"2008-12-21"}],"format":"application/pdf","billing":["billing_file"],"filename":"IPSJ-MPS06062002.pdf","filesize":[{"value":"523.7 kB"}],"mimetype":"application/pdf","priceinfo":[{"tax":["include_tax"],"price":"660","billingrole":"5"},{"tax":["include_tax"],"price":"330","billingrole":"6"},{"tax":["include_tax"],"price":"0","billingrole":"17"},{"tax":["include_tax"],"price":"0","billingrole":"44"}],"accessrole":"open_date","version_id":"111e3fd0-dc38-4d95-a0b4-73c9ccb37b41","displaytype":"detail","licensetype":"license_note","license_note":"Copyright (c) 2006 by the Information Processing Society of Japan"}]},"item_4_creator_5":{"attribute_name":"著者名","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"松縄, 哲明"},{"creatorName":"野里博和"},{"creatorName":"坂無英徳"},{"creatorName":"村川, 正宏"},{"creatorName":"高橋, 栄一"},{"creatorName":"寺澤, 恒男"},{"creatorName":"田中, 稔彦"},{"creatorName":"須賀, 治"},{"creatorName":"樋口, 哲也"}],"nameIdentifiers":[{}]}]},"item_4_creator_6":{"attribute_name":"著者名(英)","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"TETSUAKI, MATSUNAWA","creatorNameLang":"en"},{"creatorName":"HlROKAZU, NOSATO","creatorNameLang":"en"},{"creatorName":",HlDENORI, SAKANASHI","creatorNameLang":"en"},{"creatorName":"MASAHIRO, MURAKAWA","creatorNameLang":"en"},{"creatorName":"ElICHI, TAKAHASHI","creatorNameLang":"en"},{"creatorName":"TSUNEO, TERASAWA","creatorNameLang":"en"},{"creatorName":"TOSHIHIKO, TANAKA","creatorNameLang":"en"},{"creatorName":"OSAMU, SUGA","creatorNameLang":"en"},{"creatorName":"TETSUYA, HlGUCHI","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_4_source_id_9":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN10505667","subitem_source_identifier_type":"NCID"}]},"item_4_textarea_12":{"attribute_name":"Notice","attribute_value_mlt":[{"subitem_textarea_value":"SIG Technical Reports are nonrefereed and hence may later appear in any journals, conferences, symposia, etc."}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourceuri":"http://purl.org/coar/resource_type/c_18gh","resourcetype":"technical report"}]},"item_4_description_7":{"attribute_name":"論文抄録","attribute_value_mlt":[{"subitem_description":"我々は既に，光リソグラフイにおけるマスク製造コストの削減を目指し，適応型光近接効果補正（適応型OPC）技術を提案している本論文では，適応型ＯＰＣ技術の計算時間をより削減するために，新たにInfluential領域を提案する．Influential領域とは，マスクパターンを構成するセル内部のパターン情報によって定義される領域で，セル内部のパターンに対応する光近接効果の領域を定めるものである．この技術により，従来の適応型ＯＰＣでは一律に定めていた光近接効果領域を厳密に指定することで，計算が必要な領域を低減することができる．この結果，従来の適応型ＯＰＣ手法と比べてＯＰＣ計算時間を削減することが可能となる．既存のLSIパターンに提案手法を適用した検証実験の結果，計算時間の大幅な削減が可能となる見通しを得た．","subitem_description_type":"Other"}]},"item_4_description_8":{"attribute_name":"論文抄録(英)","attribute_value_mlt":[{"subitem_description":"This paper proposes a new approach to optical proximity correction (OPC) utilizing an influential area to achieve optimal OPC feature generation for the full-chip area at fast op erational speeds. We have demonstrated the adaptive OPC technique using an optimization method after layout design. The influential area is an area defined by pattern information for a cell constituting a mask pattern. This determines the area of the optical proximity effect (OPE), which corresponds to the cell pattern. The proposed method can reduce the calculation area by strictly defining the OPE area for conventional adaptive OPC methods. Accordingly, the proposed method can reduce OPC calculation times compared to conven tional adaptive OPC techniques. The effectiveness of this approach in terms of both reduced times for accurate simulations and repeated modification of OPCed features is demonstrated through computational experiments","subitem_description_type":"Other"}]},"item_4_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicPageEnd":"8","bibliographic_titles":[{"bibliographic_title":"情報処理学会研究報告数理モデル化と問題解決（MPS）"}],"bibliographicPageStart":"5","bibliographicIssueDates":{"bibliographicIssueDate":"2006-12-21","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"135(2006-MPS-062)","bibliographicVolumeNumber":"2006"}]},"relation_version_is_last":true,"weko_creator_id":"1"},"id":33063,"updated":"2025-01-22T15:52:10.597730+00:00","links":{},"created":"2025-01-18T23:01:59.972451+00:00"}