{"id":27155,"updated":"2025-01-22T18:41:03.674363+00:00","links":{},"created":"2025-01-18T22:57:35.306368+00:00","metadata":{"_oai":{"id":"oai:ipsj.ixsq.nii.ac.jp:00027155","sets":["1164:2036:2055:2057"]},"path":["2057"],"owner":"1","recid":"27155","title":["キャラクタプロジェクション法のためのセルライプラリ開発手法"],"pubdate":{"attribute_name":"公開日","attribute_value":"2005-10-21"},"_buckets":{"deposit":"9f4ecb14-bec2-40ed-bf7d-92f04f6e4c30"},"_deposit":{"id":"27155","pid":{"type":"depid","value":"27155","revision_id":0},"owners":[1],"status":"published","created_by":1},"item_title":"キャラクタプロジェクション法のためのセルライプラリ開発手法","author_link":["0","0"],"item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"キャラクタプロジェクション法のためのセルライプラリ開発手法"},{"subitem_title":"A cell library development methodology for character proJection","subitem_title_language":"en"}]},"item_type_id":"4","publish_date":"2005-10-21","item_4_text_3":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_value":"財団法人九州システム情報技術研究所"},{"subitem_text_value":"九州大学"},{"subitem_text_value":"九州大学"},{"subitem_text_value":"イービーム"},{"subitem_text_value":"東京エレクトロン"},{"subitem_text_value":"イービーム"},{"subitem_text_value":"東京エレクトロン"},{"subitem_text_value":"イービーム"},{"subitem_text_value":"九州大学"},{"subitem_text_value":"九州大学"},{"subitem_text_value":"東京大学"}]},"item_4_text_4":{"attribute_name":"著者所属(英)","attribute_value_mlt":[{"subitem_text_value":"ISIT","subitem_text_language":"en"},{"subitem_text_value":"kyushu University","subitem_text_language":"en"},{"subitem_text_value":"kyushu University","subitem_text_language":"en"},{"subitem_text_value":"ebeam","subitem_text_language":"en"},{"subitem_text_value":"Tokyo Electron","subitem_text_language":"en"},{"subitem_text_value":"ebeam","subitem_text_language":"en"},{"subitem_text_value":"Tokyo Electron","subitem_text_language":"en"},{"subitem_text_value":"ebeam","subitem_text_language":"en"},{"subitem_text_value":"kyushu University","subitem_text_language":"en"},{"subitem_text_value":"kyushu University","subitem_text_language":"en"},{"subitem_text_value":"Universitu of Tokyo","subitem_text_language":"en"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_publisher":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"情報処理学会","subitem_publisher_language":"ja"}]},"publish_status":"0","weko_shared_id":-1,"item_file_price":{"attribute_name":"Billing file","attribute_type":"file","attribute_value_mlt":[{"url":{"url":"https://ipsj.ixsq.nii.ac.jp/record/27155/files/IPSJ-SLDM05121033.pdf"},"date":[{"dateType":"Available","dateValue":"2007-10-21"}],"format":"application/pdf","billing":["billing_file"],"filename":"IPSJ-SLDM05121033.pdf","filesize":[{"value":"839.2 kB"}],"mimetype":"application/pdf","priceinfo":[{"tax":["include_tax"],"price":"660","billingrole":"5"},{"tax":["include_tax"],"price":"330","billingrole":"6"},{"tax":["include_tax"],"price":"0","billingrole":"10"},{"tax":["include_tax"],"price":"0","billingrole":"44"}],"accessrole":"open_date","version_id":"c5bbae17-d69b-4429-affc-01e6f15be06c","displaytype":"detail","licensetype":"license_note","license_note":"Copyright (c) 2005 by the Information Processing Society of Japan"}]},"item_4_creator_5":{"attribute_name":"著者名","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"杉原, 真"},{"creatorName":"高田, 大河"},{"creatorName":"中村, 健太"},{"creatorName":"稲浪良市"},{"creatorName":"林, 博昭"},{"creatorName":"岸本, 克己"},{"creatorName":"長谷部, 鉄也"},{"creatorName":"河野, 幸弘"},{"creatorName":"松永, 裕介"},{"creatorName":"村上, 和彰"},{"creatorName":"奥村, 勝弥"}],"nameIdentifiers":[{}]}]},"item_4_creator_6":{"attribute_name":"著者名(英)","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Makoto, SUGIHARA","creatorNameLang":"en"},{"creatorName":"Taiga, TAKATA","creatorNameLang":"en"},{"creatorName":"Kenta, NAKAMURA","creatorNameLang":"en"},{"creatorName":"Ryoichi, INANAMI","creatorNameLang":"en"},{"creatorName":"Hiroaki, HAYASHI","creatorNameLang":"en"},{"creatorName":"Katsumi, KISHIMOTO","creatorNameLang":"en"},{"creatorName":"Tetsuya, HASEBE","creatorNameLang":"en"},{"creatorName":"Yukihiro, KAWANO","creatorNameLang":"en"},{"creatorName":"Yusuke, MATSUNAGA","creatorNameLang":"en"},{"creatorName":"Kazuaki, MURAKAMI","creatorNameLang":"en"},{"creatorName":"Katsuya, OKUMURA","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_4_source_id_9":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11451459","subitem_source_identifier_type":"NCID"}]},"item_4_textarea_12":{"attribute_name":"Notice","attribute_value_mlt":[{"subitem_textarea_value":"SIG Technical Reports are nonrefereed and hence may later appear in any journals, conferences, symposia, etc."}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourceuri":"http://purl.org/coar/resource_type/c_18gh","resourcetype":"technical report"}]},"item_4_description_7":{"attribute_name":"論文抄録","attribute_value_mlt":[{"subitem_description":"本稿では，電子ビーム直描で用いられるキャラクタプロジェクション法のスループットを向上するセルライプラリ開発手法について議論する．第一に，整数計画法に基づいたセル選択手法を提案する.製造時間 すなわちショット数が最小になるように，キャラクタプロジェクション法で描画するセルと，VSBで描画するセルを選択する.次に，セルの反転の有無が回路の面積と遅延に及ぼす影響を調査する.反転されたセルはCPアバーチヤマスク上では異なるものとして扱われるために，反転されたセルを削減することはより多くのセルをCPアバーチヤマスク上に搭載できることを意味する．最後に，ケーススタディを行い，提案手法の有効性を検証する.","subitem_description_type":"Other"}]},"item_4_description_8":{"attribute_name":"論文抄録(英)","attribute_value_mlt":[{"subitem_description":"We propose a cell library development methodology for throughput enhancement of electron beam direct-write (EBDW) systems. First, an ILP (Integer Linear Programming)-based cell selection is proposed for EBDW systems in which both of the character projection (CP) and the variable shaped beam (VSB) methods are available, in order to minimize the number of electron beam (EB) shots, that is, time to fabricate chips. Secondly, the inInence of cell directions on area and delay time of chips is examined. The examination helps to reduce the number of EB shots with a little deterioration of area and delay time because unnecessary directions of cells can be removed to increase the number of cells on a CP aperture mask. Finally, a case study is shown in which the numbers of EB shots are examined under several cases.","subitem_description_type":"Other"}]},"item_4_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicPageEnd":"202","bibliographic_titles":[{"bibliographic_title":"情報処理学会研究報告システムLSI設計技術（SLDM）"}],"bibliographicPageStart":"197","bibliographicIssueDates":{"bibliographicIssueDate":"2005-10-21","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"102(2005-SLDM-121)","bibliographicVolumeNumber":"2005"}]},"relation_version_is_last":true,"weko_creator_id":"1"}}