{"metadata":{"_oai":{"id":"oai:ipsj.ixsq.nii.ac.jp:00027063","sets":["1164:2036:2049:2053"]},"path":["2053"],"owner":"1","recid":"27063","title":["キャラクタプロジェクシヨン法における描画面積の最適化による描画時間の削減"],"pubdate":{"attribute_name":"公開日","attribute_value":"2006-03-17"},"_buckets":{"deposit":"d0135d30-99eb-464c-959b-c4a9148ff2cf"},"_deposit":{"id":"27063","pid":{"type":"depid","value":"27063","revision_id":0},"owners":[1],"status":"published","created_by":1},"item_title":"キャラクタプロジェクシヨン法における描画面積の最適化による描画時間の削減","author_link":["0","0"],"item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"キャラクタプロジェクシヨン法における描画面積の最適化による描画時間の削減"},{"subitem_title":"A Character Size Optimization for Increasing the Throughput of Character Projection Lithography","subitem_title_language":"en"}]},"item_type_id":"4","publish_date":"2006-03-17","item_4_text_3":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_value":"財団法人九州システム情報技術研究所"},{"subitem_text_value":"九州大学大学院システム情報科学研究院情報工学専攻"},{"subitem_text_value":"九州大学大学院システム情報科学研究院情報理学専攻"},{"subitem_text_value":"九州大学大学院システム情報科学研究院情報工学専攻"},{"subitem_text_value":"九州大学大学院システム情報科学研究院情報理学専攻"}]},"item_4_text_4":{"attribute_name":"著者所属(英)","attribute_value_mlt":[{"subitem_text_value":"ISIT","subitem_text_language":"en"},{"subitem_text_value":"Department of Informatics, Gradudate School of Information Science and Electrical Engineering, Kyushu University","subitem_text_language":"en"},{"subitem_text_value":"Department of Computer Science and Communication Engineering, Graduate School of Information Science and Electrical Engineering, Kyushu University","subitem_text_language":"en"},{"subitem_text_value":"Department of Informatics, Gradudate School of Information Science and Electrical Engineering, Kyushu University","subitem_text_language":"en"},{"subitem_text_value":"Department of Computer Science and Communication Engineering, Graduate School of Information Science and Electrical Engineering, Kyushu University","subitem_text_language":"en"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_publisher":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"情報処理学会","subitem_publisher_language":"ja"}]},"publish_status":"0","weko_shared_id":-1,"item_file_price":{"attribute_name":"Billing file","attribute_type":"file","attribute_value_mlt":[{"url":{"url":"https://ipsj.ixsq.nii.ac.jp/record/27063/files/IPSJ-SLDM06124016.pdf"},"date":[{"dateType":"Available","dateValue":"2008-03-17"}],"format":"application/pdf","billing":["billing_file"],"filename":"IPSJ-SLDM06124016.pdf","filesize":[{"value":"953.5 kB"}],"mimetype":"application/pdf","priceinfo":[{"tax":["include_tax"],"price":"660","billingrole":"5"},{"tax":["include_tax"],"price":"330","billingrole":"6"},{"tax":["include_tax"],"price":"0","billingrole":"10"},{"tax":["include_tax"],"price":"0","billingrole":"44"}],"accessrole":"open_date","version_id":"aec9c966-cf31-4d88-9c8f-f62a1402761c","displaytype":"detail","licensetype":"license_note","license_note":"Copyright (c) 2006 by the Information Processing Society of Japan"}]},"item_4_creator_5":{"attribute_name":"著者名","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"杉原, 真"},{"creatorName":"高田, 大河"},{"creatorName":"中村, 健太"},{"creatorName":"松永, 裕介"},{"creatorName":"村上, 和彰"}],"nameIdentifiers":[{}]}]},"item_4_creator_6":{"attribute_name":"著者名(英)","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Makoto, SUGIHARA","creatorNameLang":"en"},{"creatorName":"Taiga, TAKATA","creatorNameLang":"en"},{"creatorName":"Kenta, NAKAMURA","creatorNameLang":"en"},{"creatorName":"Yusuke, MATSUNAGA","creatorNameLang":"en"},{"creatorName":"Kazuaki, MURAKAMI","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_4_source_id_9":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11451459","subitem_source_identifier_type":"NCID"}]},"item_4_textarea_12":{"attribute_name":"Notice","attribute_value_mlt":[{"subitem_textarea_value":"SIG Technical Reports are nonrefereed and hence may later appear in any journals, conferences, symposia, etc."}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourceuri":"http://purl.org/coar/resource_type/c_18gh","resourcetype":"technical report"}]},"item_4_description_7":{"attribute_name":"論文抄録","attribute_value_mlt":[{"subitem_description":"本稿では，キャラクタプロジェクション法の描画能力を高めるために，描画面積を最適する手法について議論する．キャラクタプロジェクション法は電子ビーム直描やフォトマスクの製造に応用可能な描画技術である．描画装置の減価償却の意味で，キャラクタプロジェクション法の描画時間は電子デバイスやフォトマスクの価格を決定するものであり，削減されることが望ましい．本稿では，CPマスク上に配列上に搭載されるキャラクタの大きさを最適化することによって，描画時間を最小にする手法を提案する．提案手法により，既存の手法と比べて最大72％の描画時間を削減した．","subitem_description_type":"Other"}]},"item_4_description_8":{"attribute_name":"論文抄録(英)","attribute_value_mlt":[{"subitem_description":"We propose a character size optimization technique to enhance the throughput of maskless lithography as well as photomask manufacture. The number of electron beam shots to draw the patterns of circuits is a dominant factor in the manufacture time and the cost for devices. Our technique is capable of drastically reducing them by optimizing the size of characters, which are the patterns to project and are placed on CP masks. Experimental results show that our technique reduced 72.0% of EB shots in the best case, comparing with the ad hoc character sizing.","subitem_description_type":"Other"}]},"item_4_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicPageEnd":"96","bibliographic_titles":[{"bibliographic_title":"情報処理学会研究報告システムLSI設計技術（SLDM）"}],"bibliographicPageStart":"91","bibliographicIssueDates":{"bibliographicIssueDate":"2006-03-17","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"28(2006-SLDM-124)","bibliographicVolumeNumber":"2006"}]},"relation_version_is_last":true,"weko_creator_id":"1"},"id":27063,"updated":"2025-01-22T18:43:12.762703+00:00","links":{},"created":"2025-01-18T22:57:31.206075+00:00"}