{"updated":"2025-01-19T08:37:47.142276+00:00","metadata":{"_oai":{"id":"oai:ipsj.ixsq.nii.ac.jp:00238234","sets":["6164:6165:7651:11699"]},"path":["11699"],"owner":"44499","recid":"238234","title":["OPCにおいて要求光強度が近傍で不均一な状況におけるマスクパターン修正方法"],"pubdate":{"attribute_name":"公開日","attribute_value":"2024-08-21"},"_buckets":{"deposit":"80dd33d8-65f9-478f-b2d7-d7a8072e747a"},"_deposit":{"id":"238234","pid":{"type":"depid","value":"238234","revision_id":0},"owners":[44499],"status":"published","created_by":44499},"item_title":"OPCにおいて要求光強度が近傍で不均一な状況におけるマスクパターン修正方法","author_link":["652250","652248","652247","652249"],"item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"OPCにおいて要求光強度が近傍で不均一な状況におけるマスクパターン修正方法"},{"subitem_title":"Mask Pattern Modification Method for OPC to Reduce the Non-uniform Light Intensity","subitem_title_language":"en"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"製造プロセス・液滴ルーティング","subitem_subject_scheme":"Other"}]},"item_type_id":"18","publish_date":"2024-08-21","item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_18_text_3":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_value":"東京工業大学工学院情報通信系"},{"subitem_text_value":"東京工業大学工学院情報通信系"}]},"item_publisher":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"情報処理学会","subitem_publisher_language":"ja"}]},"publish_status":"0","weko_shared_id":-1,"item_file_price":{"attribute_name":"Billing file","attribute_type":"file","attribute_value_mlt":[{"url":{"url":"https://ipsj.ixsq.nii.ac.jp/record/238234/files/IPSJ-DAS2024010.pdf","label":"IPSJ-DAS2024010.pdf"},"date":[{"dateType":"Available","dateValue":"2026-08-21"}],"format":"application/pdf","billing":["billing_file"],"filename":"IPSJ-DAS2024010.pdf","filesize":[{"value":"1.4 MB"}],"mimetype":"application/pdf","priceinfo":[{"tax":["include_tax"],"price":"660","billingrole":"5"},{"tax":["include_tax"],"price":"330","billingrole":"6"},{"tax":["include_tax"],"price":"0","billingrole":"10"},{"tax":["include_tax"],"price":"0","billingrole":"44"}],"accessrole":"open_date","version_id":"4366f5e0-cacb-4926-a252-3efe7781a3ea","displaytype":"detail","licensetype":"license_note","license_note":"Copyright (c) 2024 by the Information Processing Society of Japan"}]},"item_18_creator_5":{"attribute_name":"著者名","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"野崎, 翔太郎"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"高橋, 篤司"}],"nameIdentifiers":[{}]}]},"item_18_creator_6":{"attribute_name":"著者名(英)","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Shotaro, Nozaki","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Atsushi, Takahashi","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourceuri":"http://purl.org/coar/resource_type/c_5794","resourcetype":"conference paper"}]},"item_18_description_7":{"attribute_name":"論文抄録","attribute_value_mlt":[{"subitem_description":"本研究では目標パターンの辺をセグメントに分割し，各セグメントに対応する評価点の光強度を要求光強度となるようにセグメントを移動させることでマスクパターンを得る手法を提案する．先行研究では，近傍評価点の要求光強度を均一であるとみなし，セグメントの移動量を決定することによりマスクパターンを得る手法が提案された．その手法により得られたマスクパターンにより，目標パターンの辺の中央部では要求光強度を高い精度で達成できたが，コーナー部分の精度が課題だった．本研究では，セグメントにおける近傍の不足光振幅と自身のそれの比率をセグメント位置の決定に用いることで，コーナー部分の精度を高める手法を提案する．実験により，その成果を確認した．","subitem_description_type":"Other"}]},"item_18_description_8":{"attribute_name":"論文抄録(英)","attribute_value_mlt":[{"subitem_description":"In this paper, we propose a method that modifies a mask pattern so that the light intensity at the evaluation points approach to the target light intensity by moving the segments which are a partition of the edges of the target pattern. In a previous work, a method that modifies a mask pattern by assuming that the required light intensities at neighbor evaluation points are uniform was proposed. The mask pattern obtained by this method achieves the target light intensity at the center of an edge of the target pattern with high accuracy, but the accuracy at the corners was poor. In this paper, we propose a method that improves the accuracy at the corners by taking the required light amplitudes in neighbor evaluation points into account. Experiments confirmed that the proposed method obtains a mask pattern that achieves the target intensities at the corners as well as the center with high accuracy.","subitem_description_type":"Other"}]},"item_18_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicPageEnd":"64","bibliographic_titles":[{"bibliographic_title":"DAシンポジウム2024論文集"}],"bibliographicPageStart":"57","bibliographicIssueDates":{"bibliographicIssueDate":"2024-08-21","bibliographicIssueDateType":"Issued"},"bibliographicVolumeNumber":"2024"}]},"relation_version_is_last":true,"weko_creator_id":"44499"},"created":"2025-01-19T01:41:20.468853+00:00","id":238234,"links":{}}