{"id":236124,"updated":"2025-01-19T09:23:06.289105+00:00","links":{},"created":"2025-01-19T01:38:00.232289+00:00","metadata":{"_oai":{"id":"oai:ipsj.ixsq.nii.ac.jp:00236124","sets":["6504:11678:11689"]},"path":["11689"],"owner":"44499","recid":"236124","title":["フォトマスクの欠陥検出手法の検討"],"pubdate":{"attribute_name":"公開日","attribute_value":"2024-03-01"},"_buckets":{"deposit":"a4006b17-1762-492f-b9c2-7e57db3818ed"},"_deposit":{"id":"236124","pid":{"type":"depid","value":"236124","revision_id":0},"owners":[44499],"status":"published","created_by":44499},"item_title":"フォトマスクの欠陥検出手法の検討","author_link":["645323","645324","645325","645320","645321","645322"],"item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"フォトマスクの欠陥検出手法の検討"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"人工知能と認知科学","subitem_subject_scheme":"Other"}]},"item_type_id":"22","publish_date":"2024-03-01","item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_22_text_3":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_value":"秋田大"},{"subitem_text_value":"秋田大"},{"subitem_text_value":"秋田大"},{"subitem_text_value":"DOWAセミコンダクター秋田"},{"subitem_text_value":"DOWAエレクトロニクス株式会社"},{"subitem_text_value":"DOWAエレクトロニクス株式会社"}]},"item_publisher":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"情報処理学会","subitem_publisher_language":"ja"}]},"publish_status":"0","weko_shared_id":-1,"item_file_price":{"attribute_name":"Billing file","attribute_type":"file","attribute_value_mlt":[{"url":{"url":"https://ipsj.ixsq.nii.ac.jp/record/236124/files/IPSJ-Z86-2T-02.pdf","label":"IPSJ-Z86-2T-02.pdf"},"date":[{"dateType":"Available","dateValue":"2024-07-03"}],"format":"application/pdf","filename":"IPSJ-Z86-2T-02.pdf","filesize":[{"value":"521.6 kB"}],"mimetype":"application/pdf","accessrole":"open_date","version_id":"82090c44-3322-4824-8aba-0a5dd6dbe8c8","displaytype":"detail","licensetype":"license_note","license_note":"Copyright (c) 2024 by the Information Processing Society of Japan"}]},"item_22_creator_5":{"attribute_name":"著者名","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"下迫, 響"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"鄒, 敏"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"景山, 陽一"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"山田, 雄大"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"間舩, 修一"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"柴田, 智彦"}],"nameIdentifiers":[{}]}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourceuri":"http://purl.org/coar/resource_type/c_5794","resourcetype":"conference paper"}]},"item_22_source_id_9":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN00349328","subitem_source_identifier_type":"NCID"}]},"item_22_description_7":{"attribute_name":"論文抄録","attribute_value_mlt":[{"subitem_description":"現在，半導体製造工程の露光において使用されるフォトマスクの検査は，作業員の目視検査により行われている．しかし，現状では目視のみで確認できる大きな欠陥が確認された場合に交換されており，フォトマスクの微小な欠陥数を確認できない場合がある．加えて，目視検査には欠陥部分の見落としや，検出できない微細な欠陥部分の存在，作業員による精度のばらつき，作業員への負担が大きいといった問題が存在する．上記課題を解決するために，本研究ではフォトマスク内の欠陥数の把握や使用限界を判断するためのアルゴリズムの開発を目的とする．本稿では画像処理を用いて，正常画像と欠陥画像を分類する手法の検討を行った．","subitem_description_type":"Other"}]},"item_22_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicPageEnd":"576","bibliographic_titles":[{"bibliographic_title":"第86回全国大会講演論文集"}],"bibliographicPageStart":"575","bibliographicIssueDates":{"bibliographicIssueDate":"2024-03-01","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"1","bibliographicVolumeNumber":"2024"}]},"relation_version_is_last":true,"weko_creator_id":"44499"}}