@inproceedings{oai:ipsj.ixsq.nii.ac.jp:00206652,
 author = {Tahsin, Binte Shameem and Atsushi, Takahashi and Hiroyoshi, Tanabe and Yukihide, Kohira and Chikaaki, Kodama and Tahsin, Binte Shameem and Atsushi, Takahashi and Hiroyoshi, Tanabe and Yukihide, Kohira and Chikaaki, Kodama},
 book = {DAシンポジウム2020論文集},
 month = {Aug},
 note = {With the advancement of technology node, nano lithography is becoming more complex and OPC algorithm is becoming more aggressive. For most OPC (Optical Proximity Correction) algorithm, it is not necessary to know the intensities of all the points in the simulation region. Only checking the intensities of certain points of mask (also known as tap point intensities), the behavior of the algorithm can be decided. In this research, a look up table and sum of coherent system (SOCS) model based lithography simulator has been proposed to give enough information to algorithm faster without generating the aerial image by complex mask pattern. The goal of this research is to build a simulator for intensity modelling that can provide the tap point intensity of mask as fast as possible and to guide OPC algorithm based on tap point intensity evaluation., With the advancement of technology node, nano lithography is becoming more complex and OPC algorithm is becoming more aggressive. For most OPC (Optical Proximity Correction) algorithm, it is not necessary to know the intensities of all the points in the simulation region. Only checking the intensities of certain points of mask (also known as tap point intensities), the behavior of the algorithm can be decided. In this research, a look up table and sum of coherent system (SOCS) model based lithography simulator has been proposed to give enough information to algorithm faster without generating the aerial image by complex mask pattern. The goal of this research is to build a simulator for intensity modelling that can provide the tap point intensity of mask as fast as possible and to guide OPC algorithm based on tap point intensity evaluation.},
 pages = {142--149},
 publisher = {情報処理学会},
 title = {A Fast Look Up Table Based Lithography Simulator with SOCS Model for OPC Algorithm},
 volume = {2020},
 year = {2020}
}