{"updated":"2025-01-19T20:20:01.175458+00:00","links":{},"id":204081,"created":"2025-01-19T01:06:24.014133+00:00","metadata":{"_oai":{"id":"oai:ipsj.ixsq.nii.ac.jp:00204081","sets":["1164:4619:10081:10166"]},"path":["10166"],"owner":"44499","recid":"204081","title":["ピンホールマスクプレートを用いたプロジェクタ較正"],"pubdate":{"attribute_name":"公開日","attribute_value":"2020-03-09"},"_buckets":{"deposit":"083298d0-2d92-4a0c-9357-d80c14f0feed"},"_deposit":{"id":"204081","pid":{"type":"depid","value":"204081","revision_id":0},"owners":[44499],"status":"published","created_by":44499},"item_title":"ピンホールマスクプレートを用いたプロジェクタ較正","author_link":["504700","504697","504701","504698","504696","504699"],"item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"ピンホールマスクプレートを用いたプロジェクタ較正"},{"subitem_title":"Projector Calibration using a Pinhole Mask Plate","subitem_title_language":"en"}]},"item_type_id":"4","publish_date":"2020-03-09","item_4_text_3":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_value":"大阪大学大学院基礎工学研究科"},{"subitem_text_value":"大阪大学大学院基礎工学研究科"},{"subitem_text_value":"大阪大学大学院基礎工学研究科"}]},"item_4_text_4":{"attribute_name":"著者所属(英)","attribute_value_mlt":[{"subitem_text_value":"Graduate School of Engineering Science, Osaka University","subitem_text_language":"en"},{"subitem_text_value":"Graduate School of Engineering Science, Osaka University","subitem_text_language":"en"},{"subitem_text_value":"Graduate School of Engineering Science, Osaka University","subitem_text_language":"en"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_publisher":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"情報処理学会","subitem_publisher_language":"ja"}]},"publish_status":"0","weko_shared_id":-1,"item_file_price":{"attribute_name":"Billing file","attribute_type":"file","attribute_value_mlt":[{"url":{"url":"https://ipsj.ixsq.nii.ac.jp/record/204081/files/IPSJ-CVIM20221014.pdf","label":"IPSJ-CVIM20221014.pdf"},"format":"application/pdf","billing":["billing_file"],"filename":"IPSJ-CVIM20221014.pdf","filesize":[{"value":"3.5 MB"}],"mimetype":"application/pdf","priceinfo":[{"tax":["include_tax"],"price":"0","billingrole":"20"},{"tax":["include_tax"],"price":"0","billingrole":"44"}],"accessrole":"open_login","version_id":"3c40eb91-f9e1-4724-8ea9-b72a3cb577ba","displaytype":"detail","licensetype":"license_note","license_note":"Copyright (c) 2020 by the Institute of Electronics, Information and Communication Engineers This SIG report is only available to those in membership of the SIG."}]},"item_4_creator_5":{"attribute_name":"著者名","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"杉本, 正暁"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"岩井, 大輔"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"佐藤, 宏介"}],"nameIdentifiers":[{}]}]},"item_4_creator_6":{"attribute_name":"著者名(英)","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Masatoki, Sugimoto","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Daisuke, Iwai","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Kosuke, Sato","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_4_source_id_9":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11131797","subitem_source_identifier_type":"NCID"}]},"item_4_textarea_12":{"attribute_name":"Notice","attribute_value_mlt":[{"subitem_textarea_value":"SIG Technical Reports are nonrefereed and hence may later appear in any journals, conferences, symposia, etc."}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourceuri":"http://purl.org/coar/resource_type/c_18gh","resourcetype":"technical report"}]},"item_4_source_id_11":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"2188-8701","subitem_source_identifier_type":"ISSN"}]},"item_4_description_7":{"attribute_name":"論文抄録","attribute_value_mlt":[{"subitem_description":"従来のほとんどのプロジェクタ較正法には，投影対象の大きさや投影対象までの距離など，対象の規模に応じた広さの作業空間や較正儀が必要という共通の問題がある．この問題は，特に対象が建物ほどの大きさである場合に大きな弊害となる．そこで，本報告では対象の規模に依存せず一定の作業空間のみでプロジェクタを較正可能な方法を提案する．提案システムでは，プロジェクタ，ピンホールマスク，撮像プレートをこの順に配置する．本報告では，撮像プレートとしてフラットベッドスキヤナを使用した．プロジェクタからパターン光を投影し，マスク上に空けられたホールを通過した光線のみをスキャナで取得する．ピンホールマスクによってスキャナに届く開口が絞られるため，スキャナにピントが合っていない場合でさえ投影映像がボケない．スキャン画像からパターンをデコードすることで，投影画像平面，スキャナ画像平面間の対応関係が得られるので，プロジェクタを較正できる．実験では，システムの精度評価と，マスクの位置姿勢や数が与える推定精度への影響を調査した．","subitem_description_type":"Other"}]},"item_4_description_8":{"attribute_name":"論文抄録(英)","attribute_value_mlt":[{"subitem_description":"Although many projector calibration methods exist, most of them have same problem: depend on the size of the target or the distance from the projector to the target, they might require large workspace and a calibration gauge that is difficult to prepare. In this paper, we proposed the method that solves these problems. Our system consists of a projector, an imaging plate and a pinhole mask that can be easily prepared. In this paper, we use a flatbed scanner as an imaging palate. Pattern images are projected on the mask, and light rays passing through holes on the mask are taken by the scanner. By decoding the pattern in the scanned images, the projector can be calibrated. The mask reduces blurring of the projection even when the scanner is not in focus, so we can always calibrate the projector in a small amount of space. In the experiment, we verifled the accuracy of our system and how the poses and the number of the mask affect the accuracy of the estimated parameters.","subitem_description_type":"Other"}]},"item_4_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicPageEnd":"6","bibliographic_titles":[{"bibliographic_title":"研究報告コンピュータビジョンとイメージメディア（CVIM）"}],"bibliographicPageStart":"1","bibliographicIssueDates":{"bibliographicIssueDate":"2020-03-09","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"14","bibliographicVolumeNumber":"2020-CVIM-221"}]},"relation_version_is_last":true,"weko_creator_id":"44499"}}