{"metadata":{"_oai":{"id":"oai:ipsj.ixsq.nii.ac.jp:00200219","sets":["1164:2036:9683:9963"]},"path":["9963"],"owner":"44499","recid":"200219","title":["劣勾配法によるプロセスばらつきを考盧したマスク最適化手法"],"pubdate":{"attribute_name":"公開日","attribute_value":"2019-11-06"},"_buckets":{"deposit":"79cb1107-4100-492f-8903-9182a95d9d6d"},"_deposit":{"id":"200219","pid":{"type":"depid","value":"200219","revision_id":0},"owners":[44499],"status":"published","created_by":44499},"item_title":"劣勾配法によるプロセスばらつきを考盧したマスク最適化手法","author_link":["486651","486656","486659","486654","486657","486652","486655","486650","486658","486653"],"item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"劣勾配法によるプロセスばらつきを考盧したマスク最適化手法"},{"subitem_title":"Mask Optimization Considering Process Variation by Subgradient Method","subitem_title_language":"en"}]},"item_type_id":"4","publish_date":"2019-11-06","item_4_text_3":{"attribute_name":"著者所属","attribute_value_mlt":[{"subitem_text_value":"会津大学コンピユータ理工学部"},{"subitem_text_value":"会津大学コンピユータ理工学部"},{"subitem_text_value":"東京工業大学工学院"},{"subitem_text_value":"東京工業大学工学院"},{"subitem_text_value":"キオクシア株式会社"}]},"item_4_text_4":{"attribute_name":"著者所属(英)","attribute_value_mlt":[{"subitem_text_value":"School of Computer Science, the University of Aizu","subitem_text_language":"en"},{"subitem_text_value":"School of Computer Science, the University of Aizu","subitem_text_language":"en"},{"subitem_text_value":"Engineering College, Tokyo Institute of echnology","subitem_text_language":"en"},{"subitem_text_value":"Engineering College, Tokyo Institute of Technology","subitem_text_language":"en"},{"subitem_text_value":"KIOXIA Corporation\n\\n","subitem_text_language":"en"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_publisher":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"情報処理学会","subitem_publisher_language":"ja"}]},"publish_status":"0","weko_shared_id":-1,"item_file_price":{"attribute_name":"Billing file","attribute_type":"file","attribute_value_mlt":[{"url":{"url":"https://ipsj.ixsq.nii.ac.jp/record/200219/files/IPSJ-SLDM19189039.pdf","label":"IPSJ-SLDM19189039.pdf"},"format":"application/pdf","billing":["billing_file"],"filename":"IPSJ-SLDM19189039.pdf","filesize":[{"value":"542.2 kB"}],"mimetype":"application/pdf","priceinfo":[{"tax":["include_tax"],"price":"0","billingrole":"10"},{"tax":["include_tax"],"price":"0","billingrole":"44"}],"accessrole":"open_login","version_id":"ca796d90-4a21-4b18-b2ff-79df6424b87e","displaytype":"detail","licensetype":"license_note","license_note":"Copyright (c) 2019 by the Institute of Electronics, Information and Communication Engineers This SIG report is only available to those in membership of the SIG."}]},"item_4_creator_5":{"attribute_name":"著者名","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"小平, 行秀"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"東, 梨奈"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"松井, 知己"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"高橋, 篤司"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"児玉, 親亮"}],"nameIdentifiers":[{}]}]},"item_4_creator_6":{"attribute_name":"著者名(英)","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"Yukihide, Kohira","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Rina, Azuma","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Tomomi, Matsui","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Atsushi, Takahashi","creatorNameLang":"en"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"Chikaaki, Kodama","creatorNameLang":"en"}],"nameIdentifiers":[{}]}]},"item_4_source_id_9":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AA11451459","subitem_source_identifier_type":"NCID"}]},"item_4_textarea_12":{"attribute_name":"Notice","attribute_value_mlt":[{"subitem_textarea_value":"SIG Technical Reports are nonrefereed and hence may later appear in any journals, conferences, symposia, etc."}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourceuri":"http://purl.org/coar/resource_type/c_18gh","resourcetype":"technical report"}]},"item_4_source_id_11":{"attribute_name":"ISSN","attribute_value_mlt":[{"subitem_source_identifier":"2188-8639","subitem_source_identifier_type":"ISSN"}]},"item_4_description_7":{"attribute_name":"論文抄録","attribute_value_mlt":[{"subitem_description":"製造プロセスの微細化のために，光リソグラフィによる半導体加工技術の進展が求められている．光リソグラフイの解像度を改善する技術のうち，ウェハ上に転写されるパタンの忠実性をマスク最適化によって改善する技術を光近接効果補正 (Optical Proximity Correction，OPC) と呼び，光リソグラフィの進展において重要な役割を担っている．本稿では，マスク最適化問題に対して，ラグランジュ緩和法と劣勾配法を用いることで，プロセスばらつきに対する耐性を持つマスクを生成する手法を提案する．計算機実験において，パタンの忠実度が高く，プロセスばらつきへの耐性が高いマスクを短時間で提案手法により生成可能であることを確認する．","subitem_description_type":"Other"}]},"item_4_description_8":{"attribute_name":"論文抄録(英)","attribute_value_mlt":[{"subitem_description":"Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In resolution enhancement techniques in the optical lithography. Optical Proximity Correction (OPC), which improves shape fidelity of formed patterns on wafers against designed target patterns by mask optimization, is essential to progress the optical lithography. In this paper, a mask optimization method by using Lagrangean relaxation method and subgradient method is proposed to generate masks with high tolerance against process variation. Experimental results show that the proposed method obtains masks with high shape fidelity and high tolerance against process variation in short computational times.","subitem_description_type":"Other"}]},"item_4_biblio_info_10":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicPageEnd":"6","bibliographic_titles":[{"bibliographic_title":"研究報告システムとLSIの設計技術（SLDM）"}],"bibliographicPageStart":"1","bibliographicIssueDates":{"bibliographicIssueDate":"2019-11-06","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"39","bibliographicVolumeNumber":"2019-SLDM-189"}]},"relation_version_is_last":true,"weko_creator_id":"44499"},"id":200219,"updated":"2025-01-19T21:24:51.388363+00:00","links":{},"created":"2025-01-19T01:03:52.966004+00:00"}